Paper Title:
Atomistic Modeling of Diffusion in the TiAl Compound
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 237-240)
Edited by
M. Danielewski, R. Filipek, R. Kozubski, W. Kucza, P. Zieba, Z. Zurek
Pages
271-276
DOI
10.4028/www.scientific.net/DDF.237-240.271
Citation
Y. M. Mishin, I. V. Belova, G. E. Murch, "Atomistic Modeling of Diffusion in the TiAl Compound", Defect and Diffusion Forum, Vols. 237-240, pp. 271-276, 2005
Online since
April 2005
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Price
$32.00
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