Paper Title:
Stress Development during the Reactive Formation of Silicide Films
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 237-240)
Edited by
M. Danielewski, R. Filipek, R. Kozubski, W. Kucza, P. Zieba, Z. Zurek
Pages
801-812
DOI
10.4028/www.scientific.net/DDF.237-240.801
Citation
O. Thomas, P. Gergaud, C. Rivero, F. M. d'Heurle, "Stress Development during the Reactive Formation of Silicide Films", Defect and Diffusion Forum, Vols. 237-240, pp. 801-812, 2005
Online since
April 2005
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Price
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