Low Temperature Self-Diffusion of Iron in the 56Fe/57Fe Stable-Isotope Thin-Film System |
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| Journal | Defect and Diffusion Forum (Volumes 261 - 262) |
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| Volume | Defects and Diffusion in Semiconductors - An Annual Retrospective IX |
| Edited by | David J. Fisher |
| Pages | 85-92 |
| DOI | 10.4028/www.scientific.net/DDF.261-262.85 |
| Citation | M. Vasylyev et al., 2007, Defect and Diffusion Forum, 261-262, 85 |
| Online since | January, 2007 |
| Authors | M. Vasylyev, Sergey I. Sidorenko, S.M. Voloshko, V. Kostiuchenko, I.E. Kotenko |
| Keywords | Depth Profile, Self-Diffusion, SIMS, Stable Isotope, Thin Film |
| Abstract | Low-temperature diffusion in thin films of the stable isotopes, 56Fe/57Fe, was studied by applying secondary ion mass spectrometry (SIMS). Processing of the concentration profiles obtained was done by using the Hall – Morabitto “median gradient” method. The bulk and intergrain selfdiffusion coefficients were determined. |
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