Stress and Intermixing in Epitaxial Ni(111)/Mo(110) Superlattices |
| Journal |
Defect and Diffusion Forum (Volume 264) |
| Volume |
Diffusion and Stresses |
| Edited by |
D. L. Beke, Z. Erdélyi and I. A. Szabó |
| Pages |
1-6 |
| DOI |
10.4028/www.scientific.net/DDF.264.1 |
| Online since |
April, 2007 |
| Authors |
Gregory Abadias,
Aurelien Debelle,
Anny Michel,
Christiane Jaouen
|
| Keywords |
Anisotropy, Epitaxy, Interdiffusion, Ion Irradiation, Multilayers, Relaxation, Stress |
| Abstract |
The stress state and intermixing in epitaxial Ni/Mo multilayers grown on (11 2 0)
sapphire substrates are investigated using X-ray Diffraction (XRD). Two deposition techniques
were used, namely ion beam sputtering (IBS) and magnetron sputtering (MS), to vary the energy of
the deposited species. In both cases, high-quality superlattices with a Nishiyama-Wasserman
epitaxial relationship Ni [110] (111) // Mo [001] (110) were obtained. The residual stress state
appears rather complex, resulting from two contributions: a growth-stress whose magnitude and
sign depend on growth conditions and coherency stresses of opposite signs in the two elemental
sublayers (tensile for Ni and compressive for Mo). Post-growth ion irradiation at low fluences was
used to induce structural changes in a controlled way. For the case of IBS, it resulted in partial
stress relaxation, as the growth stress could be almost fully relaxed, while the coherency stresses
remained unchanged. For the case of MS, a distinct behavior was found: a stress increase of the
tensile component of Mo-sublayers was observed, while a stress reduction of the compressive
component was noticed. We attribute this phenomenon to ion irradiation induced intermixing. For
the Ni sublayers, this intermixing leads to a stress relaxation. The modeling of the stress evolution
during ion irradiation was performed using a triaxial stress analysis which enabled us to determine
the ‘stress-free and defect-free lattice parameter’, solely linked to chemical effect. |
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