Paper Title:
Diffusion of Implanted Metals in Tantalum Silicide
  Abstract

  Info
Periodical
Edited by
D. L. Beke, Z. Erdélyi and I. A. Szabó
Pages
151-154
DOI
10.4028/www.scientific.net/DDF.264.151
Citation
F. Salman, P. Zhang, F. A. Stevie, L. Chow, "Diffusion of Implanted Metals in Tantalum Silicide", Defect and Diffusion Forum, Vol. 264, pp. 151-154, 2007
Online since
April 2007
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Price
$32.00
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