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Effect of Bi Additions upon the Physical Properties of Germanium Telluride Glassy Semiconductors

Journal Defect and Diffusion Forum (Volume 293)
Volume Defects and Diffusion in Metals
Edited by David J. Fisher
Pages 107-112
DOI 10.4028/www.scientific.net/DDF.293.107
Citation Ambika Sharma et al., 2009, Defect and Diffusion Forum, 293, 107
Online since August, 2009
Authors Ambika Sharma, P.B. Barman
Keywords Amorphous Materials, Vapour Deposition Defects, X-Ray Diffraction (XRD)
Abstract

The effect of bismuth (Bi) additions upon the physical properties, coordination number (m), constraints (Nc), density (ρ), molar volume (Vm), cohesive energy (CE), lone pair electrons (L) and glass transition temperature (Tg) of Ge20Te80-xBix (x = 0, 1.5, 2.5, 5.0) bulk glassy alloy has been investigated. The density and molar volume of the glassy alloys has been found to increase with increasing Bi content. The CE of the investigated samples has been calculated by using the chemical bond approach (CBA) and is correlated with a decrease in the optical band-gap with increasing Bi content. The glass transition temperature has been estimated by using the Tichy–Ticha approach and was found to increase with an increase in the Bi content.

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