Paper Title:
Optical Characteristics of Tungsten Oxide Thin Films Prepared by Sputtering Technique
  Abstract

The optical properties of tungsten oxide (WO3) films prepared by DC sputtering on unheated glass substrates with different film thicknesses have been studied. The structural characteristics of the samples were investigated using X-ray diffraction. The optical properties of the prepared films were studied by transmittance and reflectance measurements, and the integrated transmittance (TUV, TVIS, and TNIR) and absorption (AUV, AVIS, and ANIR) in UV, VIS and NIR regions. The integrated UV absorption and transmittance are varied with the film thicknesses, also, no remarkable change in VIS and NIR regions was observed. The dependence of refractive index as well as extinction coefficient on wavelength was also reported. The energy gap was calculated and is located around 3.25 eV.

  Info
Periodical
Defect and Diffusion Forum (Volumes 295-296)
Edited by
David J. Fisher
Pages
11-17
DOI
10.4028/www.scientific.net/DDF.295-296.11
Citation
S.A. Aly, "Optical Characteristics of Tungsten Oxide Thin Films Prepared by Sputtering Technique", Defect and Diffusion Forum, Vols. 295-296, pp. 11-17, 2009
Online since
January 2010
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