Paper Title:
Comparison of A-Si: H from Plasma Peposition and Chemical Vapour Deposition
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 53-54)
Edited by
R.A. Weeks and D.L. Kinser
Pages
43-54
DOI
10.4028/www.scientific.net/DDF.53-54.43
Citation
Z. S. Ding, G. R. Han, "Comparison of A-Si: H from Plasma Peposition and Chemical Vapour Deposition", Defect and Diffusion Forum, Vols. 53-54, pp. 43-54, 1987
Online since
January 1987
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Price
$32.00
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