Paper Title:
Thermal Spike Regime during Ion Implantation: New Aspects
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 57-58)
Edited by
F. H. Wöhlbier
Pages
221-227
DOI
10.4028/www.scientific.net/DDF.57-58.221
Citation
L.M. Gratton, A. Miotello, C. Tosello, "Thermal Spike Regime during Ion Implantation: New Aspects", Defect and Diffusion Forum, Vols. 57-58, pp. 221-227, 1988
Online since
January 1988
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Price
$32.00
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