Point Defects and Diffusion in Silicon and Gallium Arsenide |
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| Journal | Defect and Diffusion Forum (Volume 59) |
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| Volume | Diffusion Processes in High Technology Materials |
| Edited by | D. Gupta, A.D. Romig and M.A. Dayananda |
| Pages | 1-16 |
| DOI | 10.4028/www.scientific.net/DDF.59.1 |
| Citation | U.M. Gösele et al., 1991, Defect and Diffusion Forum, 59, 1 |
| Authors | U.M. Gösele, T.Y. Tan |
| Full Paper | 
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