Dopant and Ion Beam Enhanced Grain Growth in Polycrystalline Silicon Films |
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| Journal | Defect and Diffusion Forum (Volume 59) |
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| Volume | Diffusion Processes in High Technology Materials |
| Edited by | D. Gupta, A.D. Romig and M.A. Dayananda |
| Pages | 33-46 |
| DOI | 10.4028/www.scientific.net/DDF.59.33 |
| Citation | C.V. Thompson, 1991, Defect and Diffusion Forum, 59, 33 |
| Authors | C.V. Thompson |
| Full Paper | 
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