Paper Title:
Reaction Kinetics and Electromigration Threshold in Aluminium Thin Films
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 66-69)
Edited by
F.J. Kedves and D.L. Beke
Pages
1129-1142
DOI
10.4028/www.scientific.net/DDF.66-69.1129
Citation
E. E. Glickman, N.A. Osipov, E.D. Ivanov, "Reaction Kinetics and Electromigration Threshold in Aluminium Thin Films", Defect and Diffusion Forum, Vols. 66-69, pp. 1129-1142, 1990
Online since
January 1991
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Price
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