Paper Title:
Low-Temperature Diffusion of Hydrogen and the Roles of Defects in Silicon
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 95-98)
Edited by
M. Koiwa, K. Hirano, H. Nakajima and T. Okada
Pages
1001-1006
DOI
10.4028/www.scientific.net/DDF.95-98.1001
Citation
Y. Kamiura, Y. Nishiyama, F. Hashimoto, "Low-Temperature Diffusion of Hydrogen and the Roles of Defects in Silicon", Defect and Diffusion Forum, Vols. 95-98, pp. 1001-1006, 1993
Online since
January 1993
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