Electromigration in Stressed Metal Thin Films |
| Journal |
Defect and Diffusion Forum (Volumes 95 - 98) |
| Volume |
Diffusion in Materials |
| Edited by |
M. Koiwa, K. Hirano, H. Nakajima and T. Okada |
| Pages |
257-262 |
| DOI |
10.4028/www.scientific.net/DDF.95-98.257 |
| Citation |
K.N. Tu et al., 1993, Defect and Diffusion Forum, 95-98, 257 |
| Authors |
K.N. Tu, D. Gupta |
| Keywords |
Effective Charge, Electromigration, Irreversible Thermodynamics, Microelectronic Devices, Stresses, Thin Film |
| Full Paper |
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