Paper Title:
Computer Simulations and Models on Electromigration in Al-Lines of Integrated Circuits
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 95-98)
Edited by
M. Koiwa, K. Hirano, H. Nakajima and T. Okada
Pages
263-264
DOI
10.4028/www.scientific.net/DDF.95-98.263
Citation
U. Kaeber, R. Kirchheim, "Computer Simulations and Models on Electromigration in Al-Lines of Integrated Circuits", Defect and Diffusion Forum, Vols. 95-98, pp. 263-264, 1993
Online since
January 1993
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Price
$32.00
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