Paper Title:
Interfacial Reaction and Migration Due to Binary Reaction Diffusion
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 95-98)
Edited by
M. Koiwa, K. Hirano, H. Nakajima and T. Okada
Pages
561-572
DOI
10.4028/www.scientific.net/DDF.95-98.561
Citation
M. Onishi, K. Miyake, Y. Wakamatsu, T. Shimozaki, "Interfacial Reaction and Migration Due to Binary Reaction Diffusion", Defect and Diffusion Forum, Vols. 95-98, pp. 561-572, 1993
Online since
January 1993
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Price
$32.00
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