Paper Title:
Diffusion of Implanted Tellurium-121 into Silicon
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 95-98)
Edited by
M. Koiwa, K. Hirano, H. Nakajima and T. Okada
Pages
949-954
DOI
10.4028/www.scientific.net/DDF.95-98.949
Citation
F. Rollert, N. Stolwijk, H. Mehrer, "Diffusion of Implanted Tellurium-121 into Silicon", Defect and Diffusion Forum, Vols. 95-98, pp. 949-954, 1993
Online since
January 1993
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Price
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