Paper Title:
B Diffusion in Si Predamaged with Si+, C+ and Ge+ Implantation
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 95-98)
Edited by
M. Koiwa, K. Hirano, H. Nakajima and T. Okada
Pages
967-972
DOI
10.4028/www.scientific.net/DDF.95-98.967
Citation
M. Kase, Y. Kikuchi, Y. Kataoka , H. Mori, "B Diffusion in Si Predamaged with Si+, C+ and Ge+ Implantation", Defect and Diffusion Forum, Vols. 95-98, pp. 967-972, 1993
Online since
January 1993
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Price
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