Paper Title:
Preparation and Characterization of nc-(Ti,Al)N and h-AlN Nanocrystalline Deposited by Plasma CVD Techniques
  Abstract

As alternative to TiN based material, nc-(Ti1-xAlx)N and h-AlN were deposited on steel substrate using plasma CVD technique and characterized by means of XRD, XPS, EDX. The effect of Al substitution can be shown by the decrease of the lattice parameters of TiN as the fraction of Al increases. As the fraction of Al further increases up to 0.8, the hexagonal AlN phase precipitates. The hardness of these coating are around 30 GPa higher than that prepared by other method.

  Info
Edited by
M. Gupta and Christina Y.H. Lim
Pages
219-222
DOI
10.4028/www.scientific.net/JMNM.23.219
Citation
K. Moto, S. Veprek, "Preparation and Characterization of nc-(Ti,Al)N and h-AlN Nanocrystalline Deposited by Plasma CVD Techniques", Journal of Metastable and Nanocrystalline Materials, Vol. 23, pp. 219-222, 2005
Online since
January 2005
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