Synthesis and Characterization of Ga Doped SiO2 Nanoparticles by a Reverse Micelle and Sol–Gel Processing
|Periodical||Journal of Nano Research (Volume 11)|
|Main Theme||Journal of Nano Research Vol. 11|
|Citation||Min Yeong Kim et al., 2010, Journal of Nano Research, 11, 151|
|Online since||May, 2010|
|Authors||Min Yeong Kim, Min Cheol Chu, Seong Jai Cho, Dong Sik Bae|
|Keywords||Ga Doped SiO2 Particle, Nanoparticle, Reverse Micelle, Sol-Gel Processing|
Ga doped SiO2 nanosized particles have been synthesized using a reverse micelle technique combined with metal alkoxide hydrolysis and condensation. The size of the particles and the thickness of the coating can be controlled by manipulating the relative rates of the hydrolysis and condensation reactions of tetraethyl orthosilicate(TEOS) within the micro-emulsion. The average size of synthesized Ga doped SiO2 nanoparticles were about in the size range of 10-15 nm and Ga particles 2-5 nm. The effects of synthesis parameters, such as the molar ratio of water to TEOS, and the molar ratio of water to surfactant, are discussed.