Preparation of Nano Structured SiOC Thin Film for Low k Application
|Periodical||Journal of Nano Research (Volume 11)|
|Main Theme||Journal of Nano Research Vol. 11|
|Citation||Woo Teck Kwon et al., 2010, Journal of Nano Research, 11, 85|
|Online since||May, 2010|
|Authors||Woo Teck Kwon, J.H. Lee, Soo Ryong Kim, H.T. Kim, Hyung Sun Kim, Y.H. Yu, Young Hee Kim|
|Keywords||Nanostructure, Low K, Polyphenylcarbosilane, SiOC, Thin Film|
In our study, the dielectric properties of SiOC low k thin film derived from polyphenylcarbosilane were investigated as a potential interlayer dielectrics for Cu interconnect technology. A SiOC low k thin film was fabricated onto a n-type silicon wafer by dip coating using 30wt % polyphenylcarbosilane in cyclohexane. Curing of the film was performed in air at 300°C for 2h. The thickness of the film ranges from 1 μm to 1.7 μm. The dielectric constant was determined from the capacitance data obtained from metal/polyphenylcarbosilane/conductive Si MIM capacitors and shows a dielectric constant as low as 3.26 without porosity added. The SiOC low k thin film derived from polyphenylcarbosilane shows promising application as an interlayer dielectrics for Cu interconnect technology.