Paper Title:
Nanoscaled C, Ni, Pt Thin Films
  Abstract

We have investigated the growth and characteristics of nanoscaled thin films of carbon, nickel, and platinum. The nanoscaled thin films were deposited on Si and quartz substrates with or without a surface layer of carbon, nickel, or platinum using a DC magnetron sputter deposition technique. The thicknesses, which were determined using ellipsometry, are all less than 10 nm. The film structures were examined using glazing angle incident x-ray diffractometry and Raman spectroscopy. The electrical and optical properties were determined using a four point probe technique and UV-VIS-IR spectrometry, respectively.

  Info
Periodical
Pages
29-34
DOI
10.4028/www.scientific.net/JNanoR.6.29
Citation
W. Y. Wu, C. W. Hsu, J. M. Ting, "Nanoscaled C, Ni, Pt Thin Films", Journal of Nano Research, Vol. 6, pp. 29-34, 2009
Online since
June 2009
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