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Dislocation Microstructure and Residual Long-Range Internal Stresses in Wire-Drawn Cu Single Crystals

Journal Key Engineering Materials (Volume 103)
Volume Nonequilibrium Materials
Edited by J. Lendvai
Pages 211-216
DOI 10.4028/www.scientific.net/KEM.103.211
Citation A. Borbély et al., 1995, Key Engineering Materials, 103, 211
Authors A. Borbély, G. Hoffmann, Tamás Ungár
Keywords Dislocation Density, Long-Range Internal Stresses, Wire-Drawing, X-Ray Line Profile
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