Paper Title:
CVD Reactors for Coating TiN Thin Films onto a Tungsten Carbide Surface
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 138-140)
Edited by
I.M. Low
Pages
449-478
DOI
10.4028/www.scientific.net/KEM.138-140.449
Citation
P. Ding, W.-K. Yuan, "CVD Reactors for Coating TiN Thin Films onto a Tungsten Carbide Surface", Key Engineering Materials, Vols. 138-140, pp. 449-478, 1998
Online since
September 1997
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Price
$32.00
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