Paper Title:
Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 192-195)
Main Theme
Edited by
S. Giannini and A. Moroni
Pages
255-258
DOI
10.4028/www.scientific.net/KEM.192-195.255
Citation
E.R. Love, M. Weimper, A. Boyd, M. Akay, B.J. Meenan, "Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings", Key Engineering Materials, Vols. 192-195, pp. 255-258, 2001
Online since
September 2000
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