Crystallisation and Tetragonal-Monoclinic Transformation in ZrO2 and HfO2 Dielectric Thin Films |
| Journal |
Key Engineering Materials (Volumes 206 - 213) |
| Volume |
Euro Ceramics VII |
| Edited by |
C. Kermel, V. Lardot, D. Libert and I. Urbain |
| Pages |
1285-1288 |
| DOI |
10.4028/www.scientific.net/KEM.206-213.1285 |
| Citation |
Chao Zhao et al., 2001, Key Engineering Materials, 206-213, 1285 |
| Online since |
December, 2001 |
| Authors |
Chao Zhao, Gert Roebben, Marc M. Heyns, Omer Van der Biest |
| Keywords |
Crystallization, HfO2, High-K Gate Stacks, Thin Film, Zro2 |
| Full Paper |
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