Paper Title:
Formation of TiO2-SiO2 Composite Thin Films and their Crystallization Behaviors
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 206-213)
Main Theme
Edited by
C. Kermel, V. Lardot, D. Libert and I. Urbain
Pages
539-542
DOI
10.4028/www.scientific.net/KEM.206-213.539
Citation
T. Otsuki, T. Yanagihara, Y. Sakashita, M. Sato, T. Nishide, "Formation of TiO2-SiO2 Composite Thin Films and their Crystallization Behaviors", Key Engineering Materials, Vols. 206-213, pp. 539-542, 2002
Online since
December 2001
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Price
$32.00
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