Paper Title:
Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 206-213)
Main Theme
Edited by
C. Kermel, V. Lardot, D. Libert and I. Urbain
Pages
559-562
DOI
10.4028/www.scientific.net/KEM.206-213.559
Citation
J. Desmaison, H. Hidalgo, P. Tristant, F. Naudin, D. Merle, "Remote Microwave Plasma Enhanced Chemical Vapor Deposition (RMPECVD) of Silica and Alumina Films", Key Engineering Materials, Vols. 206-213, pp. 559-562, 2002
Online since
December 2001
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Price
$32.00
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