Paper Title:
Effect of Ti Source on Preparation of Pb-Based Oxide Thin Films Using LSCVD
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 214-215)
Edited by
M. Murata, K. Koumoto and T. Takenaka, S. Fujitsu
Pages
129-132
DOI
10.4028/www.scientific.net/KEM.214-215.129
Citation
M. Higuchi, M. Y. Park, N. Wakiya, K. Shinozaki, N. Mizutani, "Effect of Ti Source on Preparation of Pb-Based Oxide Thin Films Using LSCVD", Key Engineering Materials, Vols. 214-215, pp. 129-132, 2002
Online since
July 2001
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Price
$32.00
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