SiOx Formation Process between YSZ and Si Substrate in YSZ/Si Thin Films by In-Situ TEM Analysis |
| Journal |
Key Engineering Materials (Volume 216) |
| Volume |
Electroceramics in Japan IV |
| Edited by |
N. Murata, K. Shinozaki, S. Fujitsu and T. Kimura |
| Pages |
153-0 |
| DOI |
10.4028/www.scientific.net/KEM.216.153 |
| Citation |
Takanori Kiguchi et al., 2001, Key Engineering Materials, 216, 153 |
| Authors |
Takanori Kiguchi, Naoki Wakiya, Kazuo Shinozaki, Nobuyasu Mizutani |
| Keywords |
In Situ Observation, Crystallization, Diffusion, Oxidation, Silicon, SiOx, TEM, YSZ |
| Full Paper |
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