Paper Title:

SiOx Formation Process between YSZ and Si Substrate in YSZ/Si Thin Films by In-Situ TEM Analysis

Periodical Key Engineering Materials (Volume 216)
Main Theme Electroceramics in Japan IV
Edited by N. Murata, K. Shinozaki, S. Fujitsu and T. Kimura
Pages 153-0
DOI 10.4028/www.scientific.net/KEM.216.153
Citation Takanori Kiguchi et al., 2001, Key Engineering Materials, 216, 153
Authors Takanori Kiguchi, Naoki Wakiya, Kazuo Shinozaki, Nobuyasu Mizutani
Keywords Crystallization, Diffusion, In Situ Observation, Oxidation, Silicon, SiOx, TEM, YSZ
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