Paper Title:
Preparation and Properties of SiO2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma
  Abstract

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Periodical
Key Engineering Materials (Volumes 224-226)
Edited by
Jianghong Gong and Wei Pan
Pages
219-224
DOI
10.4028/www.scientific.net/KEM.224-226.219
Citation
Z. J. Peng, W. J. Si, M.N. Xie, H.J. Fu, S. W. Lin, H. Z. Miao, "Preparation and Properties of SiO2 Thin Films Derived from Polysilanes Treated with Oxygen Plasma", Key Engineering Materials, Vols. 224-226, pp. 219-224, 2002
Online since
June 2002
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Price
$32.00
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