Site-Selective Deposition of TiO2 Thin Films Using Self-Assembled Monolayers and Their Dielectric Properties |
| Journal |
Key Engineering Materials (Volumes 228 - 229) |
| Volume |
Asian Ceramic Science for Electronics II and Electroceramics in Japan V |
| Edited by |
T. Kimura, K. Koumoto, T. Takenaka, S. Fujitsu, K. Shinozaki |
| Pages |
125-130 |
| DOI |
10.4028/www.scientific.net/KEM.228-229.125 |
| Citation |
Yoshitake Masuda et al., 2002, Key Engineering Materials, 228-229, 125 |
| Authors |
Yoshitake Masuda, Dejun Wang, Tetsu Yonezawa, Kunihito Koumoto |
| Keywords |
Micropatterning, Molecular-Recognition, MOS, Selective Growth, Self-Assembled Monolayer (SAM), Thin Film, Titanium Dioxide |
| Full Paper |
Get the full paper by clicking here
|
