Paper Title:
Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
  Abstract

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Periodical
Key Engineering Materials (Volumes 230-232)
Edited by
Teresa Vieira
Pages
591-594
DOI
10.4028/www.scientific.net/KEM.230-232.591
Citation
I. Ferreira, P. M. Vilarinho, F. M. Braz Fernandes, E. Fortunato, R. Martins, "Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique", Key Engineering Materials, Vols. 230-232, pp. 591-594, 2002
Online since
October 2002
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