Paper Title:
Production of Ti-Mg-Si Thin Films by Magnetron Sputtering and Their Phase Transformations with Temperature
  Abstract

  Info
Periodical
Key Engineering Materials (Volumes 230-232)
Edited by
Teresa Vieira
Pages
64-67
DOI
10.4028/www.scientific.net/KEM.230-232.64
Citation
B. Trindade, C. Coelho, G. Tomé, F.H. Froes, "Production of Ti-Mg-Si Thin Films by Magnetron Sputtering and Their Phase Transformations with Temperature", Key Engineering Materials, Vols. 230-232, pp. 64-67, 2002
Online since
October 2002
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: T. Yamane, Satoru Kishida, H. Tanaka, Hideki Yoshikawa, Hiroya Imao
Abstract:We deposited Bi2Sr2Ca1Cu2Oy (Bi-2212) superconducting thin films on MgO substrates with or without Al2O3 particles by the rf magnetron...
159
Authors: S.C. Chen, T.Y. Kuo, Y.C. Lin, Po Cheng Kuo
Abstract:The experimental result shows that the preferred orientations of NiO thin films are closely related to the working pressure of argon. All of...
859
Authors: Ping Luan, Jian Sheng Xie, Jin Hua Li
Chapter 3: Surface, Subsurface, and Interface Phenomena
Abstract:Using magnetron sputtering technology, the CuInSi thin films were prepared by multilayer synthesized method. The structure of CuInSi films...
822
Authors: Fei Xiong Mao, Tao Liu, Shi Wei Liu, Jing Kun Yu
Chapter 16: Sustainable Manufacturing Technologies
Abstract:Mg films were prepared by magnetron sputtering on zirconia substrate. The surface morphology, structure and adhesion performance were...
2834
Authors: Samsiah Ahmad, N.D.M. Sin, M.N. Berhan, Mohamad Rusop Mahmood
Chapter 7: Surface Engineering
Abstract:Zinc Oxide (ZnO) films were prepared on unheated glass substrate by radio frequency (RF) magnetron sputtering technique and post deposition...
602