A Study of the Fabrication of Multi-Layer Microstructures Using ELID Grinding and the Thick Photoresist Lithography Technology |
| Journal |
Key Engineering Materials (Volumes 238 - 239) |
| Volume |
Advances in Abrasive Technology V |
| Edited by |
Yongsheng Gao, Jun'ichi Tamaki and Koichi Kitajima |
| Pages |
19-22 |
| DOI |
10.4028/www.scientific.net/KEM.238-239.19 |
| Citation |
J.W. Kim et al., 2003, Key Engineering Materials, 238-239, 19 |
| Online since |
April, 2003 |
| Authors |
J.W. Kim, Yutaka Yamagata, Shinya Morita, Sei Moriyasu, Hitoshi Ohmori, Takehiro Higuchi |
| Keywords |
Complex Micro-Structures, Electroplating, ELID (ELectrolytic In-Process Dressing) Grinding, Micro-Electromechanical Systems (MEMS), SU-8, Thick Photoresist Lithography |
| Full Paper |
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