Paper Title:
Effect of Starting Materials on Deposition Behavior, Crystal Structure and Electrical Properties of MOCVD-PZT Films
  Abstract

  Info
Periodical
Edited by
T. Kimura, T. Takenaka, S. Fujitsu and K. Shinozaki
Pages
57-60
DOI
10.4028/www.scientific.net/KEM.248.57
Citation
T. Ozeki, H. Funakubo, "Effect of Starting Materials on Deposition Behavior, Crystal Structure and Electrical Properties of MOCVD-PZT Films ", Key Engineering Materials, Vol. 248, pp. 57-60, 2003
Online since
August 2003
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Kazuyuki Suzuki, De Sheng Fu, Kaori Nishizawa, Takeshi Miki, Kazumi Kato
77
Authors: Masahiro Kurachi, Hirofumi Matsuda, Takashi Iijima, Hiroshi Uchida, Seiichiro Koda
Abstract:Nd-substituted Bi4Ti3O12 (BNT) polycrystalline thin films with preferred a-/b-axes orientations were grown on sputter-grown IrO2(101) layers...
57
Authors: Xue Hui Wang, Wu Tang, Ji Jun Yang
Chapter 6: Material Design of Computer Aided
Abstract:The porous Cu film was deposited on soft PVDF substrate by magnetron sputtering at different sputtering pressure. The microstructure and...
1451
Authors: L.L. Li, Qiu Xiang Liu, Yan Zou, Xin Gui Tang, Yan Ping Jiang
Chapter 1: Advanced Material Science and Engineering, Material Processing and Manufacturing Technology
Abstract:Bi0.9Nd0.1FeO3 (BNFO) films were deposited on Si (100) and (La,Sr)(Al,Ta)O3 (100) (LAST) substrate by radio frequency (RF) magnetron...
146