Paper Title:
Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics
  Abstract

  Info
Periodical
Edited by
Keizo Uematsu and Harumi Yokokawa
Pages
139-150
DOI
10.4028/www.scientific.net/KEM.253.139
Citation
K. Koumoto, Y. Masuda, D.J. Wang, "Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics", Key Engineering Materials, Vol. 253, pp. 139-150, 2003
Online since
November 2003
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Price
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