Interfacial Reaction-Controlled Deposition and Micropatterning of Oxide Thin Films for Gate Dielectrics |
| Journal |
Key Engineering Materials (Volume 253) |
| Volume |
Ceramic Interfaces: Properties and Applications V |
| Edited by |
Keizo Uematsu and Harumi Yokokawa |
| Pages |
139-150 |
| DOI |
10.4028/www.scientific.net/KEM.253.139 |
| Citation |
Kunihito Koumoto et al., 2003, Key Engineering Materials, 253, 139 |
| Online since |
November, 2003 |
| Authors |
Kunihito Koumoto, Y. Masuda, D.J. Wang |
| Keywords |
Biomimetic, Gate Dielectric, Micropatterning, Self-Assembled Monolayer (SAM), Thin Film, Titanium Dioxide |
| Full Paper |
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