Paper Title:
Formation of Oxide Films on the Surface of Electroconductive Si3N4-TiN and Si3N4-TiB2 Materials under Electrochemical Polarization in a 3% NaCl Solution
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Periodical
Key Engineering Materials (Volumes 264-268)
Main Theme
Edited by
Hasan Mandal and Lütfi Öveçoglu
Pages
513-516
DOI
10.4028/www.scientific.net/KEM.264-268.513
Citation
V. Lavrenko, M. Desmaison-Brut, V.A. Shvets, J. Desmaison, R. Klein, "Formation of Oxide Films on the Surface of Electroconductive Si3N4-TiN and Si3N4-TiB2 Materials under Electrochemical Polarization in a 3% NaCl Solution ", Key Engineering Materials, Vols. 264-268, pp. 513-516, 2004
Online since
May 2004
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