Paper Title:
Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System
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Periodical
Key Engineering Materials (Volumes 264-268)
Main Theme
Edited by
Hasan Mandal and Lütfi Öveçoglu
Pages
643-648
DOI
10.4028/www.scientific.net/KEM.264-268.643
Citation
X. J. Liu, Z. Y. Huang, L. P. Huang, "Silicon Nitride Films Deposited by Low Pressure Chemical Vapor Deposition from SiH4-NH3-N2 System ", Key Engineering Materials, Vols. 264-268, pp. 643-648, 2004
Online since
May 2004
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