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Construction of MFIS Structure Using Alkoxy-Derived (Y,Yb)MnO3 Thin Films

Journal Key Engineering Materials (Volume 269)
Volume Electroceramics in Japan VII
Edited by M. Miyayama, T. Takenaka, M. Takata and K. Shinozaki
Pages 49-52
DOI 10.4028/www.scientific.net/KEM.269.49
Citation Kazuyuki Suzuki et al., 2004, Key Engineering Materials, 269, 49
Online since August, 2004
Authors Kazuyuki Suzuki, Kiyotaka Tanaka, De Sheng Fu, Kaori Nishizawa, Takeshi Miki, Kazumi Kato
Keywords (Y,Yb)MnO3, Alkoxy-Derived Precursor, C-V Characteristics, FET-Type Nonvolatile Memory, Leak Current Density, MFIS Structure, Y2O3
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