Paper Title:
Measurement of Outgassing in a Vacuum Environment
  Abstract

Outgassing, the evolution of gas from the material in a vacuum, is not only a source of micro contamination in a semiconductor or the flat display panel production process, but it also a limitation factor in the ultra clean process of nano-technology. The outgassing from the materials of satellites and spacecrafts must be controlled for increased safety and function because space is also a vacuum environment. Several methods are used in outgassing measurement in general, but there is no one method suitable for obtaining all outgassing data. The most suitable method for a particular application must be chosen by the experimenter or user. Three types of outgassing measurement systems were fabricated and characterized, ‘Throughput method,’ ‘Rate of Rise method’ and ‘Mass Loss Measurement method’. The outgassing rates of many kinds of materials were measured and characterized using these systems.

  Info
Periodical
Key Engineering Materials (Volumes 277-279)
Edited by
Kwang Hwa Chung, Yong Hyeon Shin, Sue-Nie Park, Hyun Sook Cho, Soon-Ae Yoo, Byung Joo Min, Hyo-Suk Lim and Kyung Hwa Yoo
Pages
831-837
DOI
10.4028/www.scientific.net/KEM.277-279.831
Citation
Y. H. Shin, S. S. Hong, I. T. Lim, J.H. Kim, D. J. Seong, K. H. Chung, G.W. Moon, S. W. Choi, "Measurement of Outgassing in a Vacuum Environment", Key Engineering Materials, Vols. 277-279, pp. 831-837, 2005
Online since
January 2005
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