Paper Title:
Site-Defined Micropatterning Using Atomic Force Microscopic Lithography
  Abstract

Site-defined metal microstructure was fabricated on the pre-designed organic template via a surface modification of Si(100) wafer. Site-defined substrate with octadecyltrichlorosilane (OTS) was oxidized by AFM (Atomic Force Microscopy) at threshold voltage (Vo). Terminal group (-CH3) of OTS was changed into carboxyl group (-COOH). Then, locally modified monolayer surface was used to induce the site-selective self-assembly of different materials (organic, metal, and semiconductor), according to the predefined patterns. The target metal selected is copper ions for the feasibility examination of conductive metal line fabrication

  Info
Periodical
Key Engineering Materials (Volumes 277-279)
Edited by
Kwang Hwa Chung, Yong Hyeon Shin, Sue-Nie Park, Hyun Sook Cho, Soon-Ae Yoo, Byung Joo Min, Hyo-Suk Lim and Kyung Hwa Yoo
Pages
903-906
DOI
10.4028/www.scientific.net/KEM.277-279.903
Citation
I. H. Choi, Y. H. Kim, C. M. Kim, J. S. Kim, K. H. Choi, J. H. Yi, "Site-Defined Micropatterning Using Atomic Force Microscopic Lithography", Key Engineering Materials, Vols. 277-279, pp. 903-906, 2005
Online since
January 2005
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Price
$32.00
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