Paper Title:
SiC Coatings Deposited by RF Magnetron Sputtering
  Abstract

Amorphous SiC coatings were deposited by RF magnetron sputtering from a sintered SiC target onto Si(100) substrate at room temperature. The influence of RF power on the surface morphology and the RMS surface roughness of the resulting SiC coatings was studied by using atomic force microscopy. Two types of surface morphologies were obtained. The corresponding forming mechanisms were also discussed.

  Info
Periodical
Key Engineering Materials (Volumes 280-283)
Edited by
Wei Pan, Jianghong Gong, Chang-Chun Ge and Jing-Feng Li
Pages
1309-1312
DOI
10.4028/www.scientific.net/KEM.280-283.1309
Citation
H. D. Tang, S. H. Tan, Z. R. Huang, "SiC Coatings Deposited by RF Magnetron Sputtering", Key Engineering Materials, Vols. 280-283, pp. 1309-1312, 2005
Online since
February 2007
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Price
$32.00
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