Paper Title:
Diamond Coated on Cobalt-Deficient Gradient Tungsten Carbide
  Abstract

In order to improve the adhesion between diamond coatings and cemented tungsten carbide (WC-Co) substrates, the diamond coatings were deposited on one kind of cobalt-deficient gradient WC-Co by the microwave plasma chemical vapor deposition (MPCVD). Scanning electron microscopy, X-ray diffraction and Raman spectroscopy were used to characterize the diamond coatings. The results showed dense, well facet diamond coatings. The cobalt content at the surface of substrate was measured by electron probe microanalysis. It was found that Co did not largely move to the surface as usual with deposition time increasing compared with the conventional tungsten carbide; The cobalt content at the surface of substrate after deposition (about 1 wt %) was lower than before (3.42wt%), which improved diamond coating’s adhesion against the tungsten carbide substrate.

  Info
Periodical
Key Engineering Materials (Volumes 280-283)
Edited by
Wei Pan, Jianghong Gong, Chang-Chun Ge and Jing-Feng Li
Pages
1889-1892
DOI
10.4028/www.scientific.net/KEM.280-283.1889
Citation
L. Gou, J. L. Zhu, J. G. Ran, S. F. Yan, "Diamond Coated on Cobalt-Deficient Gradient Tungsten Carbide", Key Engineering Materials, Vols. 280-283, pp. 1889-1892, 2005
Online since
February 2007
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Price
$32.00
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