Amorphous hydrogenated carbon (a-C:H) thin films were deposited on silicon wafers and Ti6Al4V substrate using plasma ion immersion implantation and deposition (PIII-D) at room temperature (R.T.). The composition and structure of a-C:H films were employed by X-ray photoelectron spectra (XPS) and Raman spectra. Nano-indenter tests measured the hardness of the films. In addition, wettability and bloodcompatibility were investigated. In this paper, the effects of hydrogen content on structure, mechanical properties, surface wettability and haemocompatibility were discussed.