Paper Title:
Verification of Prediction Method for Electromigration Failure Using Angled Polycrystalline Line
  Abstract

Electromigration is one of the main damage mechanisms of interconnecting metal lines. Recently, a governing parameter for electromigration damage in passivated polycrystalline lines, AFD* gen, was formulated, and a prediction method for electromigration failure in passivated polycrystalline line was developed using AFD* gen. This method requires only the film characteristics of the metal line and the application is not limited by a line shape and operating condition. The usefulness of the method has been shown using the straight-shaped lines. Using the ymmetrically and asymmetrically angled lines experiments are performed, and the line-shape dependency of the lifetime obtained by the prediction method is verified comparing with the results obtained from the experiment.

  Info
Periodical
Key Engineering Materials (Volumes 297-300)
Edited by
Young-Jin Kim, Dong-Ho Bae and Yun-Jae Kim
Pages
263-268
DOI
10.4028/www.scientific.net/KEM.297-300.263
Citation
S. Uno, M. Hasegawa, K. Sasagawa, M. Saka, "Verification of Prediction Method for Electromigration Failure Using Angled Polycrystalline Line ", Key Engineering Materials, Vols. 297-300, pp. 263-268, 2005
Online since
November 2005
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Price
$32.00
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