Paper Title:
Barium Titanate Micropatterns Prepared by Electron Beam Lithography and Electrophoretic Deposition
  Abstract

Electron beam lithography combined with electrophoretic deposition was investigated to fabricate micropatterned barium titanate (BTO) with nanostructures. High quality resist molds with micropatterns of microgrids and microdot arrays were prepared on Pt/Ti/SiO2/Si substrate by electron beam lithography. BTO nanocrystallites in a pseudo-cubic perovskite phase with an average particle size of about 10 nm were synthesized by a high-concentration sol-gel process. Well-dispersed and stable suspensions of barium titanate nanocrystallites were synthesized. Then, BTO microlines, microgrids and microdot arrays were electrophoretically deposited on micropatterned Pt/Ti/SiO2/Si substrate from these suspensions. The microstructure and properties of the BTO micropatterns were evaluated.

  Info
Periodical
Edited by
Masaru Miyayama, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki
Pages
247-250
DOI
10.4028/www.scientific.net/KEM.301.247
Citation
Y. J. Wu, J. Li, M. Kuwabara, "Barium Titanate Micropatterns Prepared by Electron Beam Lithography and Electrophoretic Deposition", Key Engineering Materials, Vol. 301, pp. 247-250, 2006
Online since
January 2006
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$32.00
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