Paper Title:
Effect of Acid Etching on Surface Chemistry and Microstructure of HA and CMP Grit-Blasted Ti Surface
  Abstract

Grit blasting using bioactive HA and biodegradable CMP followed by acid etching has been done. HNO3 and H3PO4 were used for the etching solution by controlling the concentration and etching time to know the effect on the surface chemistry and morphology of the Ti implant. Characterization of samples was done by using SEM, EDX and surface profilometer. The contents of residues on Ti surface decreased with increasing acid concentration and etching time. It was observed that the acidic etching rate of HA grits on Ti surface was faster than that of CMP grits. And HNO3 etched more rapidly the HA and CMP grits on Ti surface, compared to H3PO4. Therefore, the surface roughness of dental implants can be controlled by having appropriate combination of acid concentration and etching time.

  Info
Periodical
Key Engineering Materials (Volumes 309-311)
Main Theme
Edited by
Takashi Nakamura, Kimihiro Yamashita and Masashi Neo
Pages
391-394
DOI
10.4028/www.scientific.net/KEM.309-311.391
Citation
A.W. Haryadi, C. K. You, S. Y. Kim, E. K. Park, K. H. Kim, S. Y. Kim, "Effect of Acid Etching on Surface Chemistry and Microstructure of HA and CMP Grit-Blasted Ti Surface", Key Engineering Materials, Vols. 309-311, pp. 391-394, 2006
Online since
May 2006
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Price
$32.00
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