Paper Title:
Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern
  Abstract

Apatite pattern was prepared by electrophoretic deposition (EPD) transcribing resist pattern. A porous polytetrafluoroethylene (PTFE) film was used as a substrate and attached on a cathode. The cathode for EPD was stainless plate with resist pattern. EPD was performed with a suspension of wollastonite particles in acetone and wollastonite particles were deposited on the substrate in the form of the resist pattern. When the wollastonite-deposited substrate was soaked in simulated body fluid (SBF), apatite was induced and then replaced wollastonite at the wollastonite deposited region on the substrate. As a result, apatite was formed in the pattern that traced the resist pattern. The minimum line width of the apatite pattern was about 100 µm.

  Info
Periodical
Key Engineering Materials (Volumes 309-311)
Main Theme
Edited by
Takashi Nakamura, Kimihiro Yamashita and Masashi Neo
Pages
659-662
DOI
10.4028/www.scientific.net/KEM.309-311.659
Citation
S. Yamaguchi, T. Yabutsuka, M. Hibino, T. Yao, "Apatite Pattern Formation by Electrophoretic Deposition Transcribing Resist Pattern ", Key Engineering Materials, Vols. 309-311, pp. 659-662, 2006
Online since
May 2006
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$32.00
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