Apatite pattern was prepared by electrophoretic deposition (EPD) transcribing resist pattern. A porous polytetrafluoroethylene (PTFE) film was used as a substrate and attached on a cathode. The cathode for EPD was stainless plate with resist pattern. EPD was performed with a suspension of wollastonite particles in acetone and wollastonite particles were deposited on the substrate in the form of the resist pattern. When the wollastonite-deposited substrate was soaked in simulated body fluid (SBF), apatite was induced and then replaced wollastonite at the wollastonite deposited region on the substrate. As a result, apatite was formed in the pattern that traced the resist pattern. The minimum line width of the apatite pattern was about 100 µm.