Paper Title:
Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer
  Abstract

This paper presents an approach to fabricate nanoscale gratings by direct imprint on silicon substrate. Imprint conditions that affect the transcription accuracy, such as imprint temperature and pressure, are discussed, and the profile of the imprinted 80nm width gratings with a 250 nm pitch is checked by SEM. High fidelity and fine uniformity demonstrate that nanoimprint is an economical and efficient method to fabricate nanoscale gratings.

  Info
Periodical
Key Engineering Materials (Volumes 315-316)
Edited by
Zhejun Yuan, Xipeng Xu, Dunwen Zuo, Julong Yuan and Yingxue Yao
Pages
825-828
DOI
10.4028/www.scientific.net/KEM.315-316.825
Citation
X.Q. Fan, H.H. Zhang, S. Liu, K. Jia, Z.Y. Gan, "Fabrication of Nanoscale Gratings by Nanoimprint on Silicon Wafer", Key Engineering Materials, Vols. 315-316, pp. 825-828, 2006
Online since
July 2006
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Hui Min Xie, Yan Jie Li, Hua Du, Bing Pan, Qiang Luo, Chang Zhi Gu, Hai Chang Jiang
Abstract:In this study, focused gallium ion (Ga+) beam is utilised to fabricate micro/submicron spacing gratings on specimen surface. The grating...
710
Authors: Kao Feng Yarn, Wen Chung Chang, Wei Ching Chuang
Abstract:A new diffraction optics element (DOE) which combines semiconductor laser and polymer-based DOE processing technology into a single...
389
Authors: Chih Wei Hsu, Feng Tsai Weng, Chi Ting Ho
Micro-Machining Technology
Abstract:In this paper, we proposed a method to fabricate a D-shaped optical fiber of Bragg surface grating filter component by D-shaped fiber...
1799
Authors: Daiji Noda, Atsushi Tokuoka, Tadashi Hattori
Chapter 5: MEMS/NEMS
Abstract:We have fabricated X-ray diffraction gratings for X-ray phase imaging using X-ray Talbot interferometer. In this paper, we propose the new...
587